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課程名稱 |
高科技廠房設施設計
High-tech Facility Design |
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開課學期 |
101-1 |
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授課對象 |
工學院 營建工程與管理組 |
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授課教師 |
張陸滿 |
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課號 |
CIE5065 |
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課程識別碼 |
521 U3790 |
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班次 |
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學分 |
3 |
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全/半年 |
半年 |
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必/選修 |
選修 |
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上課時間 |
星期二A,B,C(18:25~21:05) |
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上課地點 |
土研402 |
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備註 |
上課時間:18:30-21:30
限學士班三年級以上
總人數上限：60人 |
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Ceiba 課程網頁 |
http://ceiba.ntu.edu.tw/1011CE_521_3790 |
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課程簡介影片 |
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核心能力關聯 |
核心能力與課程規劃關聯圖 |
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課程大綱
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課程概述 |
The purpose of this course is to provide basic design knowledge needed for cleanroom facilities that supplement high-tech manufacturing and R&D. High-Tech includes, not limited to, the advanced technologies applied in the fields of microelectronics, optoelectronics, precision equipment, telecommunication, nanotech, pharmaceutics, biotech, medical devices, animal experiment, and Aerospace. The processes undertaken in high-tech manufacturing plants and R&D labs require cleanrooms with extremely stringent environmental control.
The environmental control includes temperature and humidity level, air/water quality, purity of chemicals and gases, noise and vibration degree, electromagnetic and radio frequency interference, electrostatic discharge, materials out-gassing, safe grounding, assurance of personnel heath, safety and security and prevention of biohazard.
The focus of this course is on designing cleanroom and engineering its associated facilities. Students will gain skills needed to meet ever-changing challenge of delivering an ultra pure clean room and ultra pure utilities. Moreover, this course will strengthen students’ understanding and background in constructing high-tech manufacturing plant and research lab.
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課程目標 |
The course will enable the students to:
1.Differentiate the typical processes in semiconductor, biotech, medical devices, and pharmaceutical manufacturing and R&D.
2.Explain the interdisciplinary nature of high tech manufacturing and research
3.Perform architectural design for cleanroom and schematically layout factory.
4.Use the basic theories and principles to design systems for heating, ventilation and air conditioning (HVAC,) water/air treatment, noise and vibration mitigation.
5.Classify cleanrooms in terms of various international standards.
6.Specify the environmental control criteria for cleanroom in terms of temperature and humidity level, air/water quality, purity of chemicals and gases, noise and vibration degree, electromagnetic and radio frequency interference, electrostatic discharge, materials outgassing, and safe grounding.
7.Apply the knowledge in testing and commissioning cleanroom and its associated facilities.
8.Establish contamination control programs for constructing, operating, and maintaining the high-tech facilities.
9.Address the issues in automatically managing the emergency, safety, and security systems.
10.Link to the information sources for further studies in nano/micro fabrication and research.
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課程要求 |
This course is intended to offer to EMBA, MS, & PhD Graduates, and undergraduate Juniors and Seniors. Students in engineering, science, pharmacy, and life sciense will be exposed to fundamental theories and their applications in the design/build/certify of the high tech manufacturing plants and research labs. Academic faculty will teach basic theories and principles. Professional industrial experts will be invited to cover the application of theories and principles in the real world practices. The contents will include lectures, home works, a semester team project with an oral presentation and a written report, and a final examination. Field trips to visit high-tech plants and research labs, and cleanrooms will be arranged. Moreover, laboratory experiments will be provided to enable students to have hands-on experiences in the environmental impact on high-tech manufacturing and research. |
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預期每週課後學習時數 |
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Office Hours |
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指定閱讀 |
Whyte, W., Cleanroom Design, John Wiley, 2nd ed., New York 1999 |
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參考書目 |
1,Carlberg, David M., Cleanroom Microbiology, 2nd ed. CRC Press, Boca Raton,
Florida, 2004
2.Food and Drug Administration, Guideline on Sterile Drug Products Produced by
Aseptic Processing, FDA, Information Branch, Rockville, Maryland, USA.
3.International Organization for Standards, ISO Standard 14644-4, part 4:
Design, Construction, Start up, Geneva, Switzerland, 1999.
4.International Society of Pharmaceutical Engineering, Pharmaceutical
Engineering Guide – A Guide for New Facilities, Volume 3: Sterile Manufacturing
Facilities, ISPE, 2000.
5.Lurgi, S., Xu, J., and Zaslavsky, A., Future Trends in Microelectronics,
Wiley, N.Y, 1999.
6.Mulhall, D., Our Molecular Future: How Nanotechnology, Robotics, Genetics,
and Artificial Intelligence Will Transform Our World, Prometheus Books,
Amherst, N.Y., 2002.
7.Nishi, Y., Doering, K., and Wooldridge, T., Handbook of Semiconductor
Manufacturing Technology, Marcel Dekker, New York, 2000.
8.Scherge, M., Biological Micro- and Nanotribiology: Nature’s Solutions,
Sprinker, New York, 2001.
9.Van Zant, Peter, Microchip Fabrication: A Practical Guide to Semiconductor
Processing, 4th ed., McGraw-Hill, New York, 2000.
10.Whyte. W., Cleanroom Technology: Fundamentals of Design, Testing, and
Operation Operation, Chichester, New York, 2001.
11.Chang, C.Y., and Sze, S.M., ULSI Technology, McGraw-Hill Company, Inc.,
International Edition, 1996, New York.
12.半導體製造技術，Quirk Serda 著，羅文雄、蔡榮輝 譯 ，滄海（2003）
13.半導體奈米技術，龍文安 著，五南(2006)
14.半導體英語，傳田精一 著，陳連春 譯，建興(2003)
15.高科技廠務，顏登通，全華科技(2008)
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評量方式
(僅供參考) |
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No. |
項目 |
百分比 |
說明 |
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1. |
The Final Exam |
15% |
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2. |
Homework |
15% |
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3. |
Class participation |
10% |
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4. |
The term project |
50% |
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5. |
The lecture note |
10% |
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週次 |
日期 |
單元主題 |
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第1週 |
2012/09/11 |
Course Introduction Integrated Circuit Manufacturing Processes |
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第2週 |
2012/09/18 |
Nanotechnology Bases and Manufacturing |
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第3週 |
2012/09/25 |
Cleanroom Milestones, Fundamentals Contamination Control, and Construction Protocols |
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第4週 |
2012/10/02 |
Fab Design, Manufacturing To-Up, and Piping Contamination Control |
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第5週 |
2012/10/09 |
High-Tech Fab/Plant Layout |
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第6週 |
2012/10/16 |
Air Borne-Molecular Contaminator |
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第7週 |
2012/10/23 |
Fundamentals of Vibration, Sound & Mitigation |
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第8週 |
2012/10/30 |
Electrol-Magnetic Compatibility |
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第9週 |
2012/11/06 |
No Mid-term Exam, Field Trips TSMC-Fab14-P5 & UMC Fab12-P5 at Tainan, MIC-Tools Plant at Shanhua and ITRI-Southern Campus at Chia-Ee on 11/10 & 11/11, stay one night (11/10) at ITRI-Southern Campus |
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第10週 |
2012/11/13 |
Fundamentals of HVAC Design |
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第11週 |
2012/11/20 |
Electrical Systems and Power Stability in High-Tech Facilities |
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第12週 |
2012/11/27 |
Cleanroom Design |
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第13週 |
2012/12/04 |
No class. Compensation for Field Trip on 12/1 to TSMC Fab15 at Taichung, ChenFull-Fab at Hou-Li and Others at Hsin-Chu |
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第14週 |
2012/12/11 |
Pharmaceutical, Medical Devices, and Biotech Manufacturing and Cleanroom |
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第15週 |
2012/12/18 |
Pharmaceutical, Medical Devices, and Biotech Manufacturing and GMP |
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第16週 |
2012/12/25 |
Class is moved to 1/5/2013 for term project presentation. |
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第17週 |
2013/1/5 |
Term Project Presentation, Saturday 1PM-5PM, students must attend except in emergency |
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